PostProcess Applied sciences, a developer of automated and clever post-printing options for additive manufacturing, has been granted its fiftieth patent. Since its founding, PostProcess has prioritized a proactive and strategic method to mental property safety. Every patent represents years of analysis and improvement devoted to fixing essentially the most advanced challenges in AM, enabling clients to scale manufacturing effectively, persistently, and safely.
“Our fiftieth granted patent is greater than only a quantity, it’s a testomony to the relentless drive of our crew to repeatedly innovate,” stated Jeff Mize, CEO of PostProcess Applied sciences. “The ingenuity of our crew, mixed with invaluable enter from our 500+ clients, continues to gasoline game-changing options to the market. We’ve believed from the beginning in constructing full-stack choices that combine software program, {hardware}, and chemistry, which are protected and differentiated, leading to clever, dependable options for our clients.”
A important consider constructing this sturdy IP portfolio has been the corporate’s in-house authorized technique. “PostProcess has taken an intentional, strategic method to IP from day one,” stated Frank Kozak, Common Counsel at PostProcess. “These patent grants are an affirmation of developments within the discipline of post-processing and a validation of our method to innovation. We’ve been capable of transfer shortly, preserve high quality, and be certain that each patent aligns with our long-term imaginative and prescient to automate and scale post-printing.”
PostProcess has constructed a sturdy portfolio that safeguards the corporate’s innovations throughout all the answer stack. These patents defend not solely the proprietary {hardware} and complicated software program but in addition the chemistry that works collectively to create a whole, automated post-printing answer.
Amongst PostProcess’ flagship product strains are the BASE and DEMI sequence, which have change into the business normal for automated help and resin removing. The BASE delivers high-throughput FDM help removing with patented Volumetric Velocity Dispersion (VVD) know-how, excellent for large-format programs and high-volume manufacturing environments.
The DEMI sequence options the patented Submersed Vortex Cavitation (SVC) know-how and clever software program to exactly handle agitation, temperature, and time, attaining constant, hands-free resin and help removing throughout a variety of half geometries and supplies.
